Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films
D.L. Shimanovich
Belarusian State University of Informatics and Radioelectronics
DOI: 10.26456/pcascnn/2017.9.529
Abstract: Technological methods and conditions for additional inorganic dielectric films formation using the vacuum deposition on nanostructured porous alumina bases are investigated. Modified multilayer structures with closed porosity have been obtained. The improvement of thermophysical and electrophysical properties of finite dielectric coatings on aluminum substrates is demonstrated.
Keywords: aluminum, electrochemical anodization, porous anode alumina, nanostructured material, vacuum deposition, thermophysical and electrophysical properties.
Bibliography link:
Shimanovich, D.L. Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films / D.L. Shimanovich // Physical and chemical aspects of the study of clusters, nanostructures and nanomaterials: Interuniversity collection of proceedings / Ed. by V.M. Samsonov, N.Yu. Sdobnyakov. – Tver: TSU, 2017. – I. 9. – P. 529-535.
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