Physical and chemical aspects of the study of clusters, nanostructures and nanomaterials
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X-ray diffraction studies of the growth process of thin films of high-entropy TiNbZrTaHfCu alloy in situ using synchrotron radiation

Yu.F. Ivanov1, Yu.Kh. Akhmadeev1, A.A. Klopotov2, N.A. Prokopenko1, E.A. Petrikova1, O.V. Krysina1, V.V. Shugurov1, A.N. Shmakov3, V.Yu. Lavrov2

1 Institute of High- Current Electronics of the Siberian Branch of the RAS
2 Tomsk State University of Architecture and Building
3 Boreskov Institute of Catalysis of the Siberian Branch of the RAS

DOI: 10.26456/pcascnn/2024.16.140

Original article

Abstract: High-entropy alloys based on refractory metals, possessing an unusual combination of physical, mechanical, tribological, electrophysical, etc. properties, can be recommended for use in various fields of industry and medicine. The aim of the work is to study the growth process of high-entropy alloys films of the Ti-Nb-Zr-Ta-Hf-Cu system in real time by X-ray phase analysis using synchrotron radiation. Experiments on the deposition of multielement metal films were carried out on the VEIPS-1 setup developed at the Institute of high current electronics Siberian branch of the Russian academy of sciences for studying the processes of the film and coating formation on a synchrotron radiation source. The process of in situ thin film structure formation with high time resolution was studied using a synchrotron radiation source – the VEPP-3 electron storage ring, the Institute of nuclear physics, Siberian branch of the Russian academy of sciences. It is shown that the deposition of Ti-Nb-Zr-Ta-Hf-Cu plasma on a HG40 substrate is accompanied by the formation of an amorphous-crystalline state represented by phases of the composition (presumably) Ti-Nb-Zr-Ta-Hf-Cu, TiZr, NbZr, and CuTiZr, formed at different stages of film deposition. The main phase is the Ti-Nb-Zr-Ta-Hf-Cu composition.

Keywords: high-entropy alloy, refractory metals, synchrotron radiation, phase composition, copper alloying

  • Yuri F. Ivanov – Dr. Sc., Chief Researcher, Laboratory of Plasma Emission Electronics, Institute of High- Current Electronics of the Siberian Branch of the RAS
  • Yuri Kh. Akhmadeev – Ph. D., Head of the Laboratory of Plasma Emission Electronics, Institute of High- Current Electronics of the Siberian Branch of the RAS
  • Anatoly A. Klopotov – Dr. Sc., Professor, Department of Applied Mechanics and Materials Science, Tomsk State University of Architecture and Building
  • Nikita A. Prokopenko – Junior Researcher, Laboratory of Plasma Emission Electronics, Institute of High- Current Electronics of the Siberian Branch of the RAS
  • Elizaveta A. Petrikova – Junior Researcher, Laboratory of Plasma Emission Electronics, Institute of High- Current Electronics of the Siberian Branch of the RAS
  • Olga V. Krysina – Ph. D., Researcher, Laboratory of Plasma Emission Electronics, Institute of High- Current Electronics of the Siberian Branch of the RAS
  • Vladimir V. Shugurov – Researcher, Laboratory of Plasma Emission Electronics, Institute of High- Current Electronics of the Siberian Branch of the RAS
  • Alexander N. Shmakov – Dr. Sc., Chief Researcher, Boreskov Institute of Catalysis of the Siberian Branch of the RAS
  • Valentin Yu. Lavrov – 2nd year graduate student, Department of Applied Mechanics and Materials Science, Tomsk State University of Architecture and Building

Reference:

Ivanov, Yu.F. X-ray diffraction studies of the growth process of thin films of high-entropy TiNbZrTaHfCu alloy in situ using synchrotron radiation / Yu.F. Ivanov, Yu.Kh. Akhmadeev, A.A. Klopotov, N.A. Prokopenko, E.A. Petrikova, O.V. Krysina, V.V. Shugurov, A.N. Shmakov, V.Yu. Lavrov // Physical and chemical aspects of the study of clusters, nanostructures and nanomaterials. — 2024. — I. 16. — P. 140-153. DOI: 10.26456/pcascnn/2024.16.140. (In Russian).

Full article (in Russian): download PDF file

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