Physical and chemical aspects of the study of clusters, nanostructures and nanomaterials
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INFLUENCE OF CHEMICAL TREATMENT AND THE TEMPERATURE ON THE SURFACE POTENTIAL OF THE MONOCRYSTALLINE SILICON KDB -10 (111)

V.K. Lyuev, I.V. Lyuev

DOI: 10.26456/pcascnn/2015.7.354

Original article

Abstract: The spectra of the surface photo-EMF at temperatures of T = 289 – 473 K after processing in 10 % HF solution was investigated. It has been shown that the removal of an oxide layer reduces the concentration of surface electronic states located at the interface between silicon and surface film. In addition, the concentration of electron states in the films themselves changes. Processing in HF and subsequent washing with water reduces the concentration of traps, exciting nonequilibrium holes that deforms photomemory surface potential.

Keywords: monocrystalline silicon, surface potential, KDB-10

  • V.K. Lyuev
  • I.V. Lyuev

Reference:

Lyuev, V.K. INFLUENCE OF CHEMICAL TREATMENT AND THE TEMPERATURE ON THE SURFACE POTENTIAL OF THE MONOCRYSTALLINE SILICON KDB -10 (111) / V.K. Lyuev, I.V. Lyuev // Physical and chemical aspects of the study of clusters, nanostructures and nanomaterials. — 2015. — I. 7. — P. 354-357. DOI: 10.26456/pcascnn/2015.7.354. (In Russian).

Full article (in Russian): download PDF file

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